Uniformity for magnetically enhanced plasma chambers

Details Uniformity for magnetically enhanced plasma chambers Uniformity for magnetically enhanced plasma chambers

1991-09-12

1994-05-03

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 118723MA, 118723E, 20429837, 20429815, 20419232, 20419212, H01L 2100

Patent

active

053084179

ABSTRACT:
A plasma reactor containing within the processing chamber pieces of magnetic material located to reduce and/or substantially eliminate systematic processing rate nonuniformities. These pieces are placed inside the chamber or attached inside of the pedestal adjacent to the top of the pedestal, where the wafer is to be located for processing. The thickness, shape and magnetic permeabilities of these magnetic pieces are selected to optimize process uniformity.

REFERENCES:
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4919783 (1990-04-01), Asamaki et al.
patent: 5016564 (1991-05-01), Nakamura et al.
patent: 5079481 (1992-01-01), Moslehi
patent: 5082542 (1992-01-01), Moslehi et al.
patent: 5097430 (1992-03-01), Birang
"The American Heritage Dictionary of the English Language"; ed. William Morris; Houghton Mifflin Co.; p. 965.

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