Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-05-16
2009-11-24
Hassanzadeh, Parviz (Department: 1792)
Coating apparatus
Gas or vapor deposition
C156S345330, C156S345340
Reexamination Certificate
active
07622005
ABSTRACT:
Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein. A first gas pathway delivers a first gas through the plurality of apertures in the blocker plate with sufficient pressure drop to more evenly distribute the gases prior to passing through the gas distribution plate. A bypass gas pathway delivers a second gas through the plurality of feed through passageways in the blocker plate and to areas around the blocker plate prior to the second gas passing through the gas distribution plate.
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Balasubramanian Ganesh
Cho Tom K.
Raj Daemian
Rocha-Alvarez Juan Carlos
Applied Materials Inc.
Chandra Satish
Hassanzadeh Parviz
Patterson & Sheridan LLP
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