Uniform light exposure of positive photoresist for replicating s

Details Uniform light exposure of positive photoresist for replicating s Uniform light exposure of positive photoresist for replicating s

1980-03-10

1981-12-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430 5, 430 18, 430320, 430321, 430327, 430328, 430329, 3581285, 358129, 346137, 369277, G01D 1534, G03C 500, G11B 700, H04N 576

Patent

active

043083374

ABSTRACT:
An improved method for replicating a spiral groove pattern. The pattern is recorded in a photoresist layer which is then developed to reproduce the pattern in the photoresist layer. The pattern is transferred to a metal layer and formed in the surface of a plastic substrate. The improvement comprises the additional steps of uniformly irradiating the photoresist layer and removing the irradiated photoresist surface layer.

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patent: 4212935 (1980-07-01), Canavello et al.
Ryan, RCA Review, vol. 39, pp. 87-115, 3/1978.
Firester et al., RCA Review, vol. 39, pp. 427-471, 9/1978.

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