Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Reexamination Certificate
2008-03-31
2011-12-06
Choi, Jacob Y (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
C250S42300F, C315S111210
Reexamination Certificate
active
08072149
ABSTRACT:
A dual unbalanced indirectly heated cathode (IHC) ion chamber is disclosed. The cathodes have different surface areas, thereby affecting the amount of heat radiated by each. In the preferred embodiment, one cathode is of the size and dimension typically used for IHC ionization, as traditionally used for hot mode operation. The second cathode, preferably located on the opposite wall of the chamber, is of a smaller size. This smaller cathode is still indirectly heated by a filament, but due to its smaller size, radiates less heat into the source chamber, allowing the ion source to operate in cold mode, thereby preserving the molecular structure of the target molecules. In both modes, the unused cathode is preferably biased so as to be at the same potential as the IHC, thus allowing it to act as a repeller.
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Cho Jeong-Ha
Kim Yong-Tae
Koo Bon-Woong
Yoon Byung-Yeal
Yoon Jeong-Ho
Alemu Ephrem
Choi Jacob Y
Varian Semiconductor Equipment Associates Inc.
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