Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2004-08-12
2009-12-29
Chea, Thorl (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S311000, C430S313000, C430S323000
Reexamination Certificate
active
07638266
ABSTRACT:
A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
REFERENCES:
patent: 6043003 (2000-03-01), Bucchignano et al.
patent: 6114085 (2000-09-01), Padmanaban et al.
patent: 6261743 (2001-07-01), Pavelchek et al.
patent: 6268457 (2001-07-01), Kennedy et al.
patent: 6280911 (2001-08-01), Trefonas, III
patent: 6359125 (2002-03-01), Kim et al.
patent: 6409328 (2002-06-01), Ohkawa et al.
patent: 7256419 (2007-08-01), Jeong et al.
patent: 0 987 600 (1998-09-01), None
patent: 1 061 560 (2000-06-01), None
patent: 1 061 560 (2000-06-01), None
patent: 1 178 354 (2001-07-01), None
Angelopoulos Marie
Breyta Gregory
Huang Wu-Song
Lang Robert Neal
Li Wenjie
Capella, Esq. Steven
Chea Thorl
International Business Machines - Corporation
McGinn IP Law PLLC
LandOfFree
Ultrathin polymeric photoacid generator layer and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ultrathin polymeric photoacid generator layer and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultrathin polymeric photoacid generator layer and method of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4146795