Tunnel cathode mask for electron lithography and method for manu

Details Tunnel cathode mask for electron lithography and method for manu Tunnel cathode mask for electron lithography and method for manu

1983-07-14

1986-07-22

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

2504923, 427 431, 430942, G03C 500

Patent

active

046019715

ABSTRACT:
A mask for corpuscular lithography permits a short exposure time for generating structures on semiconductor wafers, and provides a cost reduction of such structure generation. The mask has a tunnel cathode in corpuscle-emitting regions.

REFERENCES:
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patent: 4137458 (1979-01-01), King et al.
patent: 4194123 (1980-03-01), Wittry
patent: 4197332 (1980-04-01), Broers et al.
patent: 4274035 (1981-06-01), Fukuhara et al.
patent: 4331505 (1982-05-01), Hirt
patent: 4377627 (1983-03-01), Vinton
Electronics, Nov. 3, 1981, "Electron-Beam Projector Suits up for Submicrometer Race" by Rodney Ward, Philips Research Laboratories, Redhill, Surrey, England.
Vacuum, vol. 31, No. 7, pp. 297 to 301, 1981 "Modelling of Electron Emission from Sandwich Cathodes" by R. Hrach (Mar. 24, 1981).

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