Treatment method for surface of substrate, method of...

Details Treatment method for surface of substrate, method of... Treatment method for surface of substrate, method of...

2009-01-16

2010-12-21

Richards, N Drew (Department: 2895)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S455000, C438S689000, C438S704000, C438S724000, C438S770000, C257SE21548, C257SE21568

Reexamination Certificate

active

07855149

ABSTRACT:
Provided may be a treatment method to remove defects created on the surface of a substrate, a method of fabricating an image sensor by using the treatment method, and an image sensor fabricated by the same. The treatment method may include providing a semiconductor substrate including a surface defect, providing a chemical solution to a surface of the semiconductor substrate, and removing the surface defect by consuming the surface of the semiconductor substrate and forming a chemical oxide layer on the semiconductor substrate.

REFERENCES:
patent: 2002/0062841 (2002-05-01), Twu et al.
patent: 2003-31785 (2003-01-01), None
patent: 2003-338615 (2003-11-01), None
patent: 2006-19360 (2006-01-01), None

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