Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-07-01
1996-12-17
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041921, 20419233, 20428909, 20429832, 216 59, 216 67, 1566261, 1566431, 156345, 427 8, 427585, 118723E, 118724, 118725, C23C 1454, C23C 1400, H01L 21306
Patent
active
055849717
ABSTRACT:
This invention provides a method of controlling a treatment apparatus including a treatment chamber adjustable to a desired reduced-pressure atmosphere, a mounting table arranged in the treatment chamber to mount an object to be treated, a cooling medium container provided in the mounting table, and a cooling medium supply system for supplying a cooling medium to the cooling medium container and discharging the cooling medium from the cooling medium container. The method includes the steps of treating the object to be treated while decreasing the temperature of the object to be treated by cooling the mounting table by using heat transfer from the cooling medium supplied to the cooling medium container by the cooling medium supply system, and heating the vicinity of a very small gap which traps moisture in a member constituting the treatment apparatus, when the internal temperature of the treatment apparatus is to be raised.
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Breneman R. Bruce
McDonald Rodney G.
Tokyo Electron Limited
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