Trap charge equalizing method and threshold voltage...

Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...

Reexamination Certificate

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C438S261000, C257SE21211

Reexamination Certificate

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08058187

ABSTRACT:
A method reduces a threshold voltage distribution in transistors of a semiconductor memory device, where each transistor includes a nitride liner. The method includes injecting electrons into a charge trap inside and outside the nitride liner of the transistors, and partially removing the electrons injected into the charge trap inside and outside the nitride liner to equalize trapped charges in the transistors.

REFERENCES:
patent: 5895274 (1999-04-01), Lane et al.
patent: 2005/0104119 (2005-05-01), Diorio et al.
patent: 2005/0237816 (2005-10-01), Lue et al.
patent: 2009/0032862 (2009-02-01), Maayan et al.
patent: 1020020084879 (2002-11-01), None
patent: 1020060006119 (2006-01-01), None

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