Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate
2010-01-05
2011-11-15
Ghyka, Alexander (Department: 2812)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
C438S261000, C257SE21211
Reexamination Certificate
active
08058187
ABSTRACT:
A method reduces a threshold voltage distribution in transistors of a semiconductor memory device, where each transistor includes a nitride liner. The method includes injecting electrons into a charge trap inside and outside the nitride liner of the transistors, and partially removing the electrons injected into the charge trap inside and outside the nitride liner to equalize trapped charges in the transistors.
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Kim Su-a
Song Ki-whan
Ghyka Alexander
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
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