Transistors for semiconductor device and methods of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S384000, C257S369000, C257S388000

Reexamination Certificate

active

07439596

ABSTRACT:
The present invention discloses a transistor for a semiconductor device capable of preventing the generation of a depletion capacitance in a gate pattern due to the diffusion of impurity ions. The present invention also discloses a method of fabricating the transistor.

REFERENCES:
patent: 4780429 (1988-10-01), Roche et al.
patent: 6124177 (2000-09-01), Lin et al.
patent: 6344397 (2002-02-01), Horstmann et al.
patent: 6465309 (2002-10-01), Xiang et al.
patent: 6846734 (2005-01-01), Amos et al.
patent: 2002/0072184 (2002-06-01), Higuchi
patent: 2004/0004259 (2004-01-01), Wu
patent: 2002-43563 (2002-02-01), None
patent: 2002-043563 (2002-02-01), None
patent: 1020020069502 (2002-09-01), None
A. Chatterjee et al., “Sub-100nm Gate Length Metal Gate NMOS Transistors Fabricated by a Replacement Gate Process,” 1997 IEDM p. 821-824.
Jakub Kedzierski et al, “Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation,” 2002 IEEE p. 825-828.
Tabel, B. et al., Totally silicided (CoSi2) Polysilicon: a novel approach to very Low-resistive gate without metal CMP nor etching, IEEE, 2001, pp. 37.5.1-37.5.4.

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