Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-01-10
2006-01-10
Lee, Hsien-ming (Department: 2823)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S235000, C438S309000, C438S312000
Reexamination Certificate
active
06984554
ABSTRACT:
A transistor includes a base, a collector, and an emitter comprising a group III/VI semiconductor. Microcircuits having at least one metal oxide semiconductor (MOS) transistor and the previously described transistor are provided. Processes for manufacturing a transistor and a BiMOS microcircuit are also provided.
REFERENCES:
patent: 4329625 (1982-05-01), Nishizawa et al.
patent: 5059546 (1991-10-01), Havemann
patent: 6207976 (2001-03-01), Takahashi et al.
Liao Hung
Yeh Bao-Sung Bruce
Hewlett--Packard Development Company, L.P.
Lee Hsien-ming
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