Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-08-25
1997-07-08
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419214, 20419215, 20429808, 20429811, C23C 1434
Patent
active
056456980
ABSTRACT:
Both methods and apparatus for achieving topologically precise thin film coating. The system focuses on coating systems to create compact discs using DC magnetron sputtering to avoid the occurrence of mousebites or visual imperfections at the termination edge on a masked substrate. Circuit elements are added to a switch-mode power supply which act to substantially reduce reverse currents after the signal is conditioned by rectifying and filtering a switched output. Fast acting diodes, placed in either series or parallel arrangements within the circuit involving the cathode and anode, are used with a low energy storage switch-mode power supply to completely eliminate the occurrence of mousebites on the aluminum coating or the polycarbonate substrate of the compact disc.
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U.S. Patent Application Ser. No. 08/042,619, "Enhanced Reactive DC Sputtering System", Geoffrey Drummond.
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New Method of Arc Suppression for Reactive DC-Magnetron Sputtering; Williams, et al., pp.1-16.
Previously submitted with publication date listed as Sep. 20-25, 1995; however, it is unknown whether this document was actually published.
"New Method of Arc Suppression for Reactive DC Magnetron Sputtering:" Optical Society of American Annual Meeting, Sep. 20-25, 1992; 1992 Technical Digest Series vol. 23, pp. 1-16.
Advanced Energy Industries Inc.
Nguyen Nam
Santangelo Luke
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