Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-07-02
2000-09-19
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429808, 20429811, C23C 1434
Patent
active
061206563
ABSTRACT:
Both methods and apparatus are presented for achieving topologically precise thin film coating. The system focuses on coating systems to create compact discs using DC magnetron sputtering to avoid the occurrence of mousebites or visual imperfections at the termination edge on a masked substrate. Circuit elements are added to a switch-mode power supply which acts to substantially reduce reverse currents after the signal is conditioned by rectifying and filtering a switched output. Fast acting diodes, placed in either series or parallel arrangements within the circuit involving the cathode and anode, are used with a low energy storage switch-mode power supply to completely eliminate the occurrence of mousebites on the aluminum coating or the polycarbonate substrate of the compact disc.
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Advanced Energy Industries Inc.
Nguyen Nam
VerSteeg Steven H.
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