Top antireflective coating composition containing...

Details Top antireflective coating composition containing... Top antireflective coating composition containing...

2006-08-04

2009-10-27

Hamilton, Cynthia (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C438S952000, C430S311000, C430S323000, C430S313000, C430S317000, C430S318000, C430S273100

Reexamination Certificate

active

07608390

ABSTRACT:
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.

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patent: 2003/0027076 (2003-02-01), Szmanda
patent: 2005/0233254 (2005-10-01), Hatakeyama et al.
patent: 2007/0087285 (2007-04-01), Huang et al.

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