Tool for handling wafers and epitaxial growth station

Material or article handling – Horizontally swinging load support – Swinging about pivot

Reexamination Certificate

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C414S941000, C294S064200

Reexamination Certificate

active

06991420

ABSTRACT:
A tool (7) for handling a semiconductor material wafer (100) is designed to be used in an epitaxial growth station; the tool (7) comprises a disk (20) having an upper side (21) and a lower side (22), the lower side (22) being so shaped as to get in contact with the wafer (100) only along its edge (103); the disk (20) is provided internally with a suction chamber (24) that is in communication with the outside of the disk (20) through one or more suction holes (25) and in communication with a suction duct of an arm of a robot through a suction port (26); the disk (20) entirely covers the wafer (100) and the suction holes (25) open to the lower side (22)of the disk (20), whereby, when the wafer (100) is in contact with the lower side (22) of the disk (20), it can be held by the tool (7) through suction.

REFERENCES:
patent: 4009785 (1977-03-01), Trayes
patent: 4707012 (1987-11-01), Takagi
patent: 4856766 (1989-08-01), Huberts
patent: 5188501 (1993-02-01), Tomita et al.
patent: 6043458 (2000-03-01), Fortune
patent: 6099056 (2000-08-01), Siniaguine et al.
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patent: 6254155 (2001-07-01), Kassir
patent: 6398621 (2002-06-01), Zuniga et al.
patent: 6638004 (2003-10-01), Berger et al.
patent: 2003/0014158 (2003-01-01), Berger et al.
patent: 1 022 615 (2000-07-01), None
patent: WO 00/48234 (1999-12-01), None

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