Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1996-02-14
1999-11-23
Bowers, Charles
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438609, 427529, 427561, 427564, C23C 1432
Patent
active
059899905
ABSTRACT:
The present invention relates to tinoxide thin film, a process for manufacturing thereof comprising the step of depositing tin while providing oxygen or ionized oxygen around a substrate, and relates to a gas detecting sensor prepared by the use of such tinoxide thin film.
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H. Takaoka et al. Crystallographic Properties of Tin Oxide Thin Films Prepared by R-ICB Technique, pp. 143-146, Dept. of Electronics, Kyoto University.
Choi Dongsoo
Choi Won Kook
Jeon Jin Seok
Jung Hyung Jin
Koh Seok Keun
Bowers Charles
Korea Gas Corporation
Whipple Matthew
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