Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-01-02
2007-01-02
Dang, Phuc T. (Department: 2818)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S197000, C257S107000
Reexamination Certificate
active
11026400
ABSTRACT:
A thyristor-based memory device may comprise a commonly-implanted base region, in which a common emitter region may be implanted for the left and the right thyristors in a mirror-image pair. The implanting of the base region may include directing the dopant toward a semiconductor material through a window defined by sidewalls formed in a conditioned masking material over the semiconductor material. The resulting base and emitter regions may be substantially symmetrical about a central boundary plane. In relation to the symmetry, one thyristor may be operable with a minimum holding current within about 10 percent of that for the other thyristor in the mirror-image pair.
REFERENCES:
patent: 5541121 (1996-07-01), Johnson
patent: 6888176 (2005-05-01), Horch et al.
Chih Hsin Wang and Jan Van Der Velden, A Single-Poly BiCMOS Technology with 30 GHz Bipolar FT; 1994 Bipolar/BiCMOS Circuits & Technology Meeting; 1994 IEEE; pp. 234-237.
Robins Scott
Tarabbia Marc
Dang Phuc T.
Fields IP, PS
T-RAM Semiconductor, Inc
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