Optics: measuring and testing – By configuration comparison – With comparison to master – desired shape – or reference voltage
Patent
1997-10-21
1999-06-01
Pham, Hoa Q.
Optics: measuring and testing
By configuration comparison
With comparison to master, desired shape, or reference voltage
3562371, 382146, 348126, G01B 1124, G06K 900
Patent
active
059092858
ABSTRACT:
A part inspection and calibration method for the inspection of integrated circuits includes a camera to image a precision pattern mask deposited on a transparent reticle. Small parts are placed on or above the transparent reticle to be inspected. A light source and overhead light reflective diffuser provide illumination. An overhead mirror or prism reflects a side view of the part under inspection to the camera. The scene of the part is triangulated and the dimensions of the system can thus be calibrated. A reference line is located on the transparent reticle to allow an image through the prism to the camera of the reference line between the side view and the bottom view. A precise reticle mask with dot patterns gives an additional set of information needed for calibration. By imaging more than one dot pattern the missing state values can be resolved using an iterative trigonometric solution. The system optics are designed to focus images for all perspectives without the need for an additional focusing element.
REFERENCES:
patent: 4638471 (1987-01-01), van Rosmalen
patent: 4825394 (1989-04-01), Beamish et al.
patent: 4886958 (1989-12-01), Merryman et al.
patent: 4943722 (1990-07-01), Breton et al.
patent: 5095447 (1992-03-01), Manns et al.
patent: 5113581 (1992-05-01), Hidese
patent: 5133601 (1992-07-01), Cohen et al.
patent: 5140643 (1992-08-01), Izumi et al.
patent: 5173796 (1992-12-01), Palm et al.
patent: 5204734 (1993-04-01), Cohen et al.
patent: 5276546 (1994-01-01), Palm et al.
patent: 5307149 (1994-04-01), Palm et al.
patent: 5355221 (1994-10-01), Cohen et al.
patent: 5420691 (1995-05-01), Kawaguchi
patent: 5430548 (1995-07-01), Hiroi et al.
patent: 5452080 (1995-09-01), Tomiya
patent: 5563702 (1996-10-01), Emery et al.
patent: 5563703 (1996-10-01), Lebeau et al.
patent: 5574668 (1996-11-01), Beaty
Beaty Elwin M.
Mork David P.
Moffa Emil
Pham Hoa Q.
Sun Han I.
LandOfFree
Three dimensional inspection system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Three dimensional inspection system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Three dimensional inspection system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-958555