Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2011-01-04
2011-01-04
Webb, Gregory E (Department: 1761)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
Reexamination Certificate
active
07863231
ABSTRACT:
A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
REFERENCES:
patent: 4965167 (1990-10-01), Salamy
patent: 5372742 (1994-12-01), Bayless
patent: 5750632 (1998-05-01), Rahman et al.
patent: 5866305 (1999-02-01), Chon et al.
patent: 5952150 (1999-09-01), Ohta et al.
patent: 6159646 (2000-12-01), Jeon et al.
patent: 6399267 (2002-06-01), Nishimura et al.
patent: 7063934 (2006-06-01), Saito et al.
patent: 7387988 (2008-06-01), Ahn et al.
patent: 2003/0054284 (2003-03-01), Suzuki et al.
patent: 2003/0157441 (2003-08-01), Ahn et al.
patent: 2004/0067437 (2004-04-01), Wayton et al.
patent: 2005/0176607 (2005-08-01), Ahn et al.
patent: 2007/0161530 (2007-07-01), Kaneda et al.
patent: 2008/0214422 (2008-09-01), Ahn et al.
patent: 7-271054 (1995-10-01), None
patent: 07-281425 (1995-10-01), None
patent: 2001077101 (2001-08-01), None
patent: 1020030051129 (2003-06-01), None
Ahn Seung-Hyun
Bae Eun-Mi
Choi Baik-soon
Chon Sang-mun
Kim Dae-Joung
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
Webb Gregory E
LandOfFree
Thinner composition and method of removing photoresist using... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thinner composition and method of removing photoresist using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thinner composition and method of removing photoresist using... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2738842