Thin film transistor array panel and manufacturing method...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S151000, C438S152000, C438S153000, C438S161000

Reexamination Certificate

active

07846784

ABSTRACT:
A method of manufacturing a thin film transistor array panel includes forming a gate line including a gate electrode on a substrate, forming a gate insulating layer on the gate line, forming a semiconductor layer on the gate insulating layer, forming an ohmic contact layer on the semiconductor layer, and forming a data line including a source electrode and a drain electrode on the ohmic contact layer. The method further includes depositing a conductive film on the data line and the drain electrode, forming a first photoresist on the conductive film, etching the conductive film using the first photoresist as a mask to form a pixel electrode at least connected to the drain electrode, depositing a passivation layer, and removing the first photoresist to form a passivation member.

REFERENCES:
patent: 2004/0129943 (2004-07-01), Yoo et al.
patent: 2004/0222421 (2004-11-01), Lee et al.
patent: 2005/0059199 (2005-03-01), Yamazaki et al.
patent: 2005/0110931 (2005-05-01), Yoo et al.
patent: 2005/0186698 (2005-08-01), Ishida et al.
patent: 2006/0008952 (2006-01-01), Wu et al.

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