Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Reexamination Certificate
2007-05-29
2007-05-29
Huynh, Andy (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
C257S072000, C257SE21657, C257SE27131
Reexamination Certificate
active
11008720
ABSTRACT:
A thin film array panel is provided, which includes: a gate line formed on a substrate; a first insulating layer formed on the gate line; a semiconductor layer formed on the gate insulating layer; a data line formed on the gate insulating layer and intersecting the gate line; a drain electrode formed at least on the semiconductor layer; a conductor arranged in parallel to the data line; a second insulating layer formed on the data line, the drain electrode, and the conductor and having a first contact hole exposing a portion of the drain electrode; and a pixel electrode formed on the second insulating layer, connected to the drain electrode through the first contact hole, fully covering the data line.
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patent: 2005/0082492 (2005-04-01), Lin et al.
Ahn Byeong-Jae
Kim Beom-Jun
Kim Kyung-Wook
Kim Sung-Man
Kong Hyang-Shik
Huynh Andy
MacPherson Kwok & Chen & Heid LLP
Nguyen Dao H.
Samsung Electronics Co,. Ltd.
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