Thin film thickness monitor

Details Thin film thickness monitor Thin film thickness monitor

1980-08-28

1982-10-26

Rosenberger, R. A.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

356243, 356357, G01B 1102

Patent

active

043559034

ABSTRACT:
A thin film thickness monitor uses the successive reflection of polychromatic light from a reference or standard thin film having a varying optical thickness (n.sub.1 t.sub.1) and then from a thin film of unknown thickness (t.sub.f) or optical thickness (n.sub.f t.sub.f). The reflected intensity of light from the thin film is detected to provide a signal indicating when the optical thickness of the unknown film is equal to the optical thickness of the reference.

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Konnerth et al., "In-Situ Measurement of Dielectric Thickness During Etching or Developing Processes", IEEE Transactions on Electron Devices, vol. Ed-22, No. 7, pp. 452-456, Jul. 1975.

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