Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1996-03-11
1999-11-09
Hantis, K. P.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
2503411, 250372, G01B 1106, G01J 142
Patent
active
059824964
ABSTRACT:
A method and system for measuring the thickness of a patterned film. In one embodiment, a first patterned film is impinged with electromagnetic radiation having a wavelength which varies within a given wavelength range. The electromagnetic radiation reflected from the first patterned film is measured. The thickness of the first patterned film is then measured using thickness measuring equipment. The determined thickness of the first patterned film is then correlated with the measured reflectance of the electromagnetic radiation from the first patterned film. A second patterned film is then impinged with electromagnetic radiation having a wavelength which varies within the given wavelength range. The electromagnetic radiation reflected from the second patterned film is measured. The present invention uses the previously determined correlation to determine the thickness of the second patterned film.
REFERENCES:
patent: 4680084 (1987-07-01), Heimann et al.
patent: 5120966 (1992-06-01), Kondo
patent: 5452091 (1995-09-01), Johnson
Hantis K. P.
VLSI Technology Inc.
LandOfFree
Thin film thickness and optimal focus measuring using reflectivi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thin film thickness and optimal focus measuring using reflectivi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film thickness and optimal focus measuring using reflectivi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1463869