Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-10-28
2000-01-11
Kiliman, Leszek
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427129, 427130, 428694T, 428900, G11B 566
Patent
active
060131616
ABSTRACT:
A Co--Pt based magnetic alloy which has been doped with a relatively high amount of nitrogen, e.g., at or above 1 at. % is obtained having high coercivity, for example in the range of 1400 Oe or above, and an increased signal-to-noise ratio as compared to the same Co--Pt based alloy which has not been doped with nitrogen. The alloy is vacuum deposited, for example, by sputtering, and the nitrogen may be introduced from the sputtering gas or from the sputtering target. Other low-solubility elements providing the grain uniformity and isolation include: B, P, S, C, Si, As, Se and Te.
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Chen John Ko-Jen
Chen Tu
Kadokura Keith
Ranjan Rajiv Yadav
Yamashita Tsutomu Tom
Kiliman Leszek
Komag Incorporated
Small Jonathan A.
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