Thin film deposition reactor

Details Thin film deposition reactor Thin film deposition reactor

2005-04-26

2005-04-26

Lund, Jeffrie R. (Department: 1763)

Coating apparatus

Gas or vapor deposition

C156S345290

Reexamination Certificate

active

06884297

ABSTRACT:
Provided is a thin film deposition reactor, including a reactor block having a deposition space, a wafer block, a top lid for covering and sealing the reactor block, a showerhead for spraying a reaction gas on the wafer block, and an exhaust line through which gases are exhausted from the reactor block. A lower pumping baffle and an upper pumping baffle are stacked on a bottom of the reactor block between an outer circumference of the wafer block and an inner circumference of the reactor block. A lower pumping region is formed between the lower pumping baffle and an inner sidewall of the reactor block. An upper pumping region is formed between the upper pumping baffle and the inner sidewall of the reactor block. The deposition space is connected to the upper pumping region by a plurality of upper pumping holes formed in the upper pumping baffle, and the upper pumping region is connected to the lower pumping region by a plurality of lower pumping holes formed in the lower pumping baffle. The lower pumping region is connected to the exhaust line.

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