Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1986-06-27
1988-08-09
Kittle, John
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430326, 430330, 430325, G03C 500
Patent
active
047627689
ABSTRACT:
Photo resist image layers, particularly those used for high resolution geometries in microelectronic applications, are stabilized against distortion or degradation by the heat generated during subsequent etching, ion implantation processes and the like, by the application of a film of a thermally stabilizing agent prior to post-development bake of the image layer. High temperature resistant film forming polymers, of which gelatin and gelatin hydrolysates are preferred examples, are employed as thermally stabilizing agents.
The process serves to achieve thermal stabilization of the photoresist image layer without significantly affecting the ease of subsequent stripping of the layer. It is particularly effective when used to thermally stabilize positive resist images derived from photoresist systems based on novolak resins.
REFERENCES:
patent: 2992919 (1961-07-01), Beeler et al.
patent: 3459128 (1969-08-01), Erdmann et al.
patent: 4125650 (1978-11-01), Chiu et al.
patent: 4690838 (1987-09-01), Hiraoka et al.
patent: 4701390 (1987-10-01), Grunwald et al.
Grunwald John J.
Spencer Allen C.
Dees Jos,e G.
Kittle John
MacDermid Incorporated
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