Thermal treatment apparatus

Details Thermal treatment apparatus Thermal treatment apparatus

2006-12-05

2006-12-05

Le, Thao P. (Department: 2818)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S763000

Reexamination Certificate

active

07144823

ABSTRACT:
The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.

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International Preliminary Examination Report (PCT/IPEA/409) (translated) issued for PCT/JP2002/10079.
Notification of Transmittal of Copies of Translation of the International Preliminary Examination Report (PCT/IB/338) issued for PCT/JP2002/10079.

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