Coating apparatus – Gas or vapor deposition
Patent
1999-02-12
2000-07-18
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
118728, 118729, 118500, 118668, 269 21, 269292, 269903, 20429807, 432117, 432241, 156345, C23C 1600, C23C 1400, F27D 312, C23F 102
Patent
active
060902094
ABSTRACT:
A vapor control apparatus including an endless rim, a stagnation plate and a cover having an exhaust port. The endless rim has a first edge engaging the cover, a second edge opposite the first edge, an interior region and an exterior region defined by the rim and the cover, and a flow passage from the interior region to the exterior region adjacent the cover. The exhaust port is in fluid communication with the interior region and the second edge is seatable on a wafer support. A stagnation plate is disposed in the interior region, defining a stagnant region intermediate the stagnation plate and the surface, and defining at least one flow path in fluid communication with the stagnant region and the interior region.
REFERENCES:
patent: 3460822 (1969-08-01), Link
patent: 4512283 (1985-04-01), Bonifield et al.
patent: 4597569 (1986-07-01), Itamoto et al.
patent: 4640501 (1987-02-01), Poland
patent: 4671250 (1987-06-01), Hurley et al.
patent: 4684113 (1987-08-01), Douglas et al.
patent: 4693211 (1987-09-01), Ogami et al.
patent: 4838978 (1989-06-01), Sekine et al.
patent: 4869481 (1989-09-01), Yabu et al.
patent: 4870923 (1989-10-01), Sugimoto
patent: 4955590 (1990-09-01), Narushima et al.
patent: 5199483 (1993-04-01), Bahng
patent: 5374829 (1994-12-01), Sakamoto et al.
patent: 5382311 (1995-01-01), Ishikawa et al.
patent: 5389197 (1995-02-01), Ishimaru
patent: 5462603 (1995-10-01), Murakami
patent: 5484483 (1996-01-01), Kyogoku
patent: 5516367 (1996-05-01), Lei et al.
patent: 5534073 (1996-07-01), Kinoshita et al.
patent: 5564682 (1996-10-01), Tsuji
patent: 5569350 (1996-10-01), Osada et al.
patent: 5620523 (1997-04-01), Maeda et al.
patent: 5645646 (1997-07-01), Beinglass et al.
patent: 5660673 (1997-08-01), Miyoshi
patent: 5665166 (1997-09-01), Deguchi et al.
patent: 5665167 (1997-09-01), Deguchi et al.
patent: 5669977 (1997-09-01), Shufflebotham et al.
patent: 5685914 (1997-11-01), Hills et al.
patent: 5695568 (1997-12-01), Sinha et al.
patent: 5700725 (1997-12-01), Hower et al.
patent: 5707051 (1998-01-01), Tsuji
patent: 5730801 (1998-03-01), Tepman et al.
patent: 5735960 (1998-04-01), Sandhu et al.
patent: 5738165 (1998-04-01), Imai
patent: 5796066 (1998-08-01), Guyot
patent: 5810933 (1998-09-01), Mountsier et al.
patent: 5823736 (1998-10-01), Matsumura
patent: 5858100 (1999-01-01), Maeda et al.
patent: 5861601 (1999-01-01), Sato et al.
patent: 5885353 (1999-03-01), Strodtbeck et al.
patent: 5928427 (1999-07-01), Hwang
Davis Shawn D.
Hayes Bruce L.
Molebash John S.
Smith Rex A.
Strodtbeck Timothy A.
Lund Jeffrie R
Micro)n Technology, Inc.
LandOfFree
Thermal conditioning apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thermal conditioning apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal conditioning apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2032497