Texture etching of silicon: method

Details Texture etching of silicon: method Texture etching of silicon: method

1975-12-31

1979-01-30

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

136 89CC, 156662, 252 795, H01L 3118

Patent

active

041371232

ABSTRACT:
A surface etchant for silicon comprising an anisotropic etchant containing silicon is disclosed. The etchant provides a textured surface of randomly spaced and sized pyramids on a silicon surface. It is particularly useful in reducing the reflectivity of solar cell surfaces.

REFERENCES:
patent: 3506509 (1970-04-01), Kragness
patent: 3655582 (1972-04-01), Dupree et al.
patent: 3721588 (1973-03-01), Hays
patent: 3765969 (1973-10-01), Kragness et al.
patent: 3909325 (1975-09-01), Church et al.
patent: 3966517 (1976-06-01), Claes et al.
patent: 4046594 (1977-09-01), Tarui et al.

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