Temperature controlled process and chamber lid

Details Temperature controlled process and chamber lid Temperature controlled process and chamber lid

1998-03-31

2000-12-26

Ahmad, Nasser

Coating apparatus

Gas or vapor deposition

118724, 20429809, C23C 1600

Patent

active

061652717

ABSTRACT:
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.

REFERENCES:
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patent: 5204315 (1993-04-01), Kirlin et al.
patent: 6056823 (2000-05-01), Sajoto et al.
patent: 6066209 (2000-05-01), Sajoto et al.
patent: 6077157 (2000-06-01), Fairbairn
patent: 6077562 (2000-06-01), Sajoto et al.
patent: 6082714 (2000-07-01), Dornfest et al.
PCT Search Report dated Jan. 27, 1999.
U.S. application No. 08/927,700, Somekh et al., filed Sep. 11, 1997.
U.S. application No. 09/052,747, Sajoto et al., filed Mar. 31, 1998.
U.S. application No. 09/052,765, Zhao et al., filed Mar. 31, 1998.
U.S. application No. 09/052,792, Sajoto et al., filed Mar. 31, 1998.

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