Coating apparatus – Gas or vapor deposition
Patent
1998-03-31
2000-05-16
Bueker, Richard
Coating apparatus
Gas or vapor deposition
C23C 1600
Patent
active
060631996
ABSTRACT:
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.
REFERENCES:
patent: 4592933 (1986-06-01), Meyerson et al.
patent: 5534068 (1996-07-01), Beach et al.
patent: 5542559 (1996-08-01), Kawakami et al.
patent: 5728222 (1998-03-01), Barbee et al.
patent: 5885356 (1999-03-01), Zhao et al.
Dornfest Charles
Ku Vincent
Sajoto Talex
Selyutin Leonid
Zhao Jun
Applied Materials Inc.
Bueker Richard
Fieler Erin
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