Temperature controlled gas feedthrough

Details Temperature controlled gas feedthrough Temperature controlled gas feedthrough

1998-03-31

2000-05-02

Lund, Jeffrie R

Coating apparatus

Gas or vapor deposition

C23C 1600

Patent

active

060568232

ABSTRACT:
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.

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PCT Search Report dated Jan. 27, 1999.

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