Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1998-04-08
2000-01-18
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
Multizone chamber
118712, 118715, B05C 1100, C23C 1600
Patent
active
060154659
ABSTRACT:
A temperature control system 10 is used to control the temperature of a chamber surface 15, such as a convoluted external surface, of a process chamber 25 that is used to process a semiconductor substrate 30. The temperature control system 10 comprises a vapor chamber 100 that forms an enclosure adjoining or surrounding the process chamber surface 15. A fluid distributor 115 in the vapor chamber 100 applies a fluid film 130 onto the process chamber surface 15. Vaporization of the fluid film 130 from the chamber surface 15 controls the temperature of the chamber surface. Optionally, a vent 165 in the vapor chamber 100 can be used to adjust the vaporization temperature of the fluid in the vapor chamber.
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Kholodenko Arnold
Lee Ke Ling
Quiles Efrain
Shendon Maya
Applied Materials Inc.
Breneman Bruce
Lee Paul J.
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