TEG pattern for detecting void in device isolation layer and...

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure

Reexamination Certificate

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Details

C257SE23179

Reexamination Certificate

active

07973309

ABSTRACT:
Provided is a test element group (TEG) pattern for detecting a void in a device isolation layer. The TEG pattern includes active regions which are parallel to each other and extend in a first direction, a device isolation layer that separates the active regions, a first contact that is formed across the device isolation layer and a first one of the active regions that contacts a surface of the device isolation layer, and a second contact that is formed across the device isolation layer and a second one of the active regions that contacts another surface of the device isolation layer.

REFERENCES:
patent: 7098049 (2006-08-01), Hsu et al.
patent: 7416986 (2008-08-01), Zhu et al.
patent: 2005/0104063 (2005-05-01), Hsu et al.
patent: 2007-123755 (2007-05-01), None
patent: 10-2005-0067766 (2005-07-01), None
patent: 10-2006-0078920 (2006-07-01), None

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