Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2008-07-08
2008-07-08
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492220, C250S492200, C438S010000
Reexamination Certificate
active
11123082
ABSTRACT:
A technique for tuning an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for tuning an ion implanter system having multiple beam-line elements. The method may comprise establishing one or more relationships among the multiple beam-line elements. The method may also comprise adjusting the multiple beam-line elements in a coordinated manner, based at least in part on the one or more established relationships, to produce a desired beam output.
REFERENCES:
patent: 5993050 (1999-11-01), Miura
patent: 6242747 (2001-06-01), Sugitani et al.
patent: 6403972 (2002-06-01), Cucchetti et al.
patent: 6774378 (2004-08-01), Huang et al.
patent: 2003/0042427 (2003-03-01), Sullivan et al.
patent: 2004/0022694 (2004-02-01), Hara et al.
patent: 2004/0102857 (2004-05-01), Markle et al.
patent: 2004/0262532 (2004-12-01), Krueger
patent: 2004/0262533 (2004-12-01), Krueger
patent: 2005/0092939 (2005-05-01), Coss et al.
patent: 2006/0088655 (2006-04-01), Collins et al.
Marvin R. LaFontaine, Paul J. Murphy, Edward Bell and David Holbrook, “Beam Optics of the VIISta 3000 Ion Implanter”.
Brennan Damian
Chang Shengwu
Olson Joseph C.
Berman Jack I.
Logie Michael J
Varian Semiconductor Equipment Associates Inc.
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