Technique for tuning an ion implanter system

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492220, C250S492200, C438S010000

Reexamination Certificate

active

11123082

ABSTRACT:
A technique for tuning an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for tuning an ion implanter system having multiple beam-line elements. The method may comprise establishing one or more relationships among the multiple beam-line elements. The method may also comprise adjusting the multiple beam-line elements in a coordinated manner, based at least in part on the one or more established relationships, to produce a desired beam output.

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Marvin R. LaFontaine, Paul J. Murphy, Edward Bell and David Holbrook, “Beam Optics of the VIISta 3000 Ion Implanter”.

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