Technique for monitoring and controlling a plasma process

Radiant energy – Ionic separation or analysis – Ion beam pulsing means with detector synchronizing means

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S286000, C250S42300F, C250S492200, C315S111310, C315S111810

Reexamination Certificate

active

07453059

ABSTRACT:
A time-of-flight ion sensor for monitoring ion species in a plasma includes a housing. A drift tube is positioned in the housing. An extractor electrode is positioned in the housing at a first end of the drift tube so as to attract ions from the plasma. A plurality of electrodes is positioned at a first end of the drift tube proximate to the extractor electrode. The plurality of electrodes is biased so as to cause at least a portion of the attracted ions to enter the drift tube and to drift towards a second end of the drift tube. An ion detector is positioned proximate to the second end of the drift tube. The ion detector detects arrival times associated with the at least the portion of the attracted ions.

REFERENCES:
patent: 3911314 (1975-10-01), Schulz et al.
patent: 4362936 (1982-12-01), Hofmann et al.
patent: 5218204 (1993-06-01), Houk et al.
patent: 5614711 (1997-03-01), Li et al.
patent: 5650616 (1997-07-01), Iketaki
patent: 5654543 (1997-08-01), Li
patent: 5784424 (1998-07-01), Fries et al.
patent: 5872824 (1999-02-01), Fries et al.
patent: 6101971 (2000-08-01), Denholm et al.
patent: 6137112 (2000-10-01), McIntyre et al.
patent: 6222186 (2001-04-01), Li et al.
patent: 6242735 (2001-06-01), Li et al.
patent: 6373052 (2002-04-01), Hoyes et al.
patent: 6956205 (2005-10-01), Park
patent: 6987264 (2006-01-01), Whitehouse et al.
patent: 7119330 (2006-10-01), Kalinitchenko
patent: 2003/0098413 (2003-05-01), Weinberger et al.
patent: 2004/0211897 (2004-10-01), Kim et al.
patent: 2005/0230614 (2005-10-01), Glukhoy
patent: 2007/0170994 (2007-07-01), Peggs et al.
patent: 2007/0210248 (2007-09-01), Koo et al.
patent: 2007/0227231 (2007-10-01), Koo et al.
patent: 2007/0278397 (2007-12-01), Bateman et al.
patent: 2008/0026133 (2008-01-01), Fang et al.
patent: 9856029 (1998-12-01), None
patent: 20040051850 (2004-06-01), None
Pollard, J.E., et al.; “Time-Resolved Mass and Energy Analysis by Position-Sensitive Time-Of-Flight Detection”; Review of Scientific Instruments, AIP, Melville, NY, vol. 60, No. 10; Oct. 1, 1989, pp. 3171-3180.
Jahn, P.W., et al.; “Combined Instrument for the On-Line Investigation of Plasma Deposited or Etched Surfaces by Monochromatized X-Ray Photoelectronspectroscopy and Time-Of-Flight Secondary Ion Mass Spectrometry;” Journal of Vacuum Science and Technology: Part A, AVS/AIP, Melville, NY, vol. 12, No. 3, May 1, 1994, pp. 671-676.
Gou, F., et al.; “A New Time-of-Flight Instrument Capable of In Situ and Real-Time Studies of Plasma-Treated Surfaces,” Vacuum, vol. 81, 2006, pp. 196-201.
Brown, I.G., et al., Improved Time-Of-Flight Ion Charge State Diagnostic, Rev. Sci. Instrum., Sep. 1987, pp. 1589-,1592, vol. 58, No. 9, American Institute of Physics.
Okuji, S., et al., Spatial Distributions Of Ion-Species In A Large-Volume Inductively Coupled Plasma Source, Surface & Coatings Technology, 2001, pp. 102-105, vol. 136, Elsevier Science B.V.
Rosen, Johanna, et al., Charge State And Time Resolved Plasma Composition Of A Pulsed Zirconium Arc In A Nitrogen Environment, Journal Of Applied Physics, 2004, pp. 4793-4799, vol. 96, No. 9, American Institute Of Physics.
Saito, Naoaki, et al., Development Of A Compact Time-Of-Flight Mass Spectrometer With A Length Of 1 m For Processing Plasma Diagnostics, Jpn. J. Appl. Phys., Aug. 2003, pp. 5306-5312, vol. 42, No. 8, The Japan Society of Applied Physics.
R.M. Jordon & Co., Inc., “TOF Fundamentals,” pp. 1-18, downloaded on Mar. 10, 2006 from http:/www.rmjordan.com/Resources/Tutorial.pdf.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Technique for monitoring and controlling a plasma process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Technique for monitoring and controlling a plasma process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Technique for monitoring and controlling a plasma process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4043255

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.