Target assembly having inner and outer targets

Details Target assembly having inner and outer targets Target assembly having inner and outer targets

1995-03-09

1996-04-30

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20419215, 20429808, 20429817, 20429816, 20429817, 20429819, C23C 1435

Patent

active

055121500

ABSTRACT:
A target assembly for use in fabricating magnetic recording media is described. The target assembly has inner and outer concentric targets for sputter depositing on a substrate first and second layers having different compositions. Disposed adjacent each target is a magnetic means, and at least one which is reversible in magnetic-pole polarity. One polarity produces a magnetic flux sufficient to ignite a sputtering plasma in the inner target only, when power is supplied to the inner target at a preselected level. The opposite polarity produces a magnetic flux sufficient to ignite a sputtering plasma in the outer target only, when power is supplied to the outer target at a preselected level.

REFERENCES:
patent: 4569746 (1986-02-01), Hutchinson
patent: 4604180 (1986-08-01), Hirukawa et al.
patent: 4610774 (1986-09-01), Sakata et al.
patent: 4761218 (1988-08-01), Boys
patent: 4957605 (1990-09-01), Hurwitt et al.
patent: 5174880 (1992-12-01), Bourez et al.
patent: 5366607 (1994-11-01), Lal et al.

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