Target and dark space shield for a physical vapor deposition sys

Details Target and dark space shield for a physical vapor deposition sys Target and dark space shield for a physical vapor deposition sys

1996-03-07

1997-08-19

Kunemund, Robert

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429811, 20419212, C23C 1434

Patent

active

056584423

ABSTRACT:
The disadvantages heretofore associated with the prior art are overcome by the present invention of an improved target for a physical deposition (PVD) system. The improved target has a portion of the target side wall the overhangs and shadows the side wall of the target thus preventing material from depositing on the edge. To further reduce contaminant generation, the improved target is combined with an improved dark space shield having a first end and a second end, where the second end conventionally supports a collimator and the first end has an inner surface that is substantially vertical.

REFERENCES:
patent: 3749662 (1973-07-01), Biehl
patent: 4414086 (1983-11-01), Lamont, Jr.
patent: 4457825 (1984-07-01), Lamont, Jr.

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