Tantalum sputtering target with fine grains and uniform...

Metal treatment – Process of modifying or maintaining internal physical... – Producing or treating layered – bonded – welded – or...

Reexamination Certificate

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C148S668000

Reexamination Certificate

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07101447

ABSTRACT:
A method for producing a tantalum sputtering component includes a minimum of three stages each of which include a deformation step followed by an inert atmosphere high-temperature anneal. Temperatures of each of the anneal steps can be different from one another. A tantalum sputtering component includes a mean grain size of less than about 100 microns and a uniform texture throughout the component thickness. The uniform texture can be predominately {111}<uvw>.

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