Tantalum oxide anti-reflective coating (ARC) integrated with a m

Details Tantalum oxide anti-reflective coating (ARC) integrated with a m Tantalum oxide anti-reflective coating (ARC) integrated with a m

1998-02-23

1999-12-21

Niebling, John F.

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438636, 438785, H01L 21336

Patent

active

060048506

ABSTRACT:
A method for forming a tantalum-based anti-reflective coating (ARC) layer begins by forming an MOS metallic gate electrode layer (20) over a substrate (20). The MOS metallic gate electrode layer (20) is covered with an ARC layer (22). The ARC layer is preferably tantalum pentoxide or a tantalum pentoxide layer doped with one or more of nitrogen atoms and/or silicon atoms. The layers (22 and 20) are then selectively masked photoresist (24) that is selectively exposed to deep ultraviolet (DUV) radiation (28). The ARC layer (22) improves lithographic critical dimension (CD) control of the MOS metallic gate during exposure. The final MOS metallic gate is then patterned and etched using a fluorine-chlorine-fluorine time-progressed reactive ion etch (RIE) process, whereby metallic-gate MOS transistors are eventually formed.

REFERENCES:
patent: 4156622 (1979-05-01), Lindmayer
patent: 4201798 (1980-05-01), Lindmayer
patent: 4372987 (1983-02-01), Ganner et al.
patent: 4707820 (1987-11-01), Sawamura
patent: 5100822 (1992-03-01), Mitani
patent: 5181141 (1993-01-01), Sato et al.
patent: 5444006 (1995-08-01), Han et al.
patent: 5457570 (1995-10-01), Lu et al.
patent: 5605609 (1997-02-01), Ando et al.
patent: 5710073 (1998-01-01), Jent et al.
patent: 5721167 (1998-02-01), Subramanian et al.
patent: 5882999 (1999-03-01), Anderson et al.
patent: 5918132 (1999-06-01), Qian et al.
patent: 5918147 (1999-06-01), Filipiak et al.
Rehg, et al., "Solgel Derived Tantalum Pentoxide Films as Ultraviolet Antireflective Coatings for Silicon", Applied Optics, vol. 28, No. 24, pp. 5215-5221 (1989).

Affiliated with

Also associated with

Rating

Tantalum oxide anti-reflective coating (ARC) integrated with a m does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Tantalum oxide anti-reflective coating (ARC) integrated with a m, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tantalum oxide anti-reflective coating (ARC) integrated with a m will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-504456