Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Reexamination Certificate
2008-05-13
2008-05-13
Jiang, Shaojia Anna (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
C427S069000
Reexamination Certificate
active
11625918
ABSTRACT:
Tantalum precursors useful in depositing tantalum nitride or tantalum oxides materials on substrates, by processes such as chemical vapor deposition and atomic layer deposition. The precursors are useful in forming tantalum-based diffusion barrier layers on microelectronic device structures featuring copper metallization and/or ferroelectric thin films.
REFERENCES:
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5711816 (1998-01-01), Kirlin et al.
patent: 5820664 (1998-10-01), Gardiner et al.
patent: 6015917 (2000-01-01), Bhandari et al.
patent: 6552209 (2003-04-01), Lei et al.
patent: 6593484 (2003-07-01), Yasuhara et al.
patent: 6960675 (2005-11-01), Chen et al.
Baum Thomas H.
Chen Tianniu
Xu Chongying
Advanced Technology & Materials Inc.
Chappuis Maggie
Hultquist Steven J.
Intellectual Property / Technology Law
Jiang Shaojia Anna
LandOfFree
Tantalum amide complexes for depositing tantalum-containing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tantalum amide complexes for depositing tantalum-containing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tantalum amide complexes for depositing tantalum-containing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3957019