Coating apparatus – Control means responsive to a randomly occurring sensed... – Temperature responsive
Reexamination Certificate
2006-09-28
2010-12-07
Tadesse, Yewebdar T (Department: 1713)
Coating apparatus
Control means responsive to a randomly occurring sensed...
Temperature responsive
C118S697000, C118S429000
Reexamination Certificate
active
07845308
ABSTRACT:
Systems having an in-line microwave heater to heat fluids for processing a substrate are provided. An embodiment of a system includes a microelectronic processing chamber, a reservoir for storing a fluid used to process wafers within the chamber, a supply line for transporting the fluid to the chamber, and a microwave heater arranged along the supply line. The system includes processor executable program instructions for operating the microwave heater at parameters configured to heat fluid within the supply line to a temperature greater than a fluid temperature within the reservoir, such as approximately 20° C. greater than the reservoir fluid temperature. It is noted that the inclusion of an in-line microwave heater is not limited to microelectronic fabrication systems, but may be used for any system in which heated fluids are used for processing a substrate, such as but not limited to electroplating or electroless plating systems.
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Corneille Jason
Flanders Steven
Franklin Timothy J.
Gilbert Nancy E.
Jones Stephen C.
Daffer Kevin L.
Daffer McDaniel LLP
Lam Research Corporation
Lettang Mollie E.
Tadesse Yewebdar T
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