Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate
2008-04-15
2009-11-24
Lauchman, L. G (Department: 2877)
Optics: measuring and testing
By polarized light examination
Of surface reflection
C356S445000, C356S446000
Reexamination Certificate
active
07623239
ABSTRACT:
Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
REFERENCES:
patent: 4905170 (1990-02-01), Forouhi et al.
patent: 4999014 (1991-03-01), Gold et al.
patent: 5166752 (1992-11-01), Spanier et al.
patent: 5181080 (1993-01-01), Fanton et al.
patent: 5486701 (1996-01-01), Norton et al.
patent: 5489980 (1996-02-01), Anthony
patent: 5608526 (1997-03-01), Piwonka-Corle et al.
patent: 5747813 (1998-05-01), Norton et al.
patent: 5771094 (1998-06-01), Carter et al.
patent: 5859702 (1999-01-01), Lindblom
patent: 5877859 (1999-03-01), Aspnes et al.
patent: 5910842 (1999-06-01), Piwonka-Corle et al.
patent: 5953446 (1999-09-01), Opsal et al.
patent: 6052401 (2000-04-01), Wiesser et al.
patent: 6177995 (2001-01-01), Compain et al.
patent: 6181421 (2001-01-01), Aspnes et al.
patent: 6184984 (2001-02-01), Lee et al.
patent: 6211957 (2001-04-01), Erdosan et al.
patent: 6261853 (2001-07-01), Howell et al.
patent: 6269144 (2001-07-01), Dube et al.
patent: 6282222 (2001-08-01), Wiesser et al.
patent: 6313466 (2001-11-01), Olsen et al.
patent: 6325078 (2001-12-01), Kamieniecki
patent: 6400089 (2002-06-01), Salvermoser et al.
patent: 6440760 (2002-08-01), Cho et al.
patent: 6456362 (2002-09-01), Banine
patent: 6515746 (2003-02-01), Opsal et al.
patent: 6519045 (2003-02-01), Kwon
patent: 6522717 (2003-02-01), Murakami et al.
patent: 6532076 (2003-03-01), Sidorowich
patent: 6535286 (2003-03-01), Green et al.
patent: 6555485 (2003-04-01), Liv et al.
patent: 6559007 (2003-05-01), Weimer
patent: 6583876 (2003-06-01), Opsal et al.
patent: 6591024 (2003-07-01), Westbrook
patent: 6610614 (2003-08-01), Niimi et al.
patent: 6610615 (2003-08-01), McFadden et al.
patent: 6611330 (2003-08-01), Lee et al.
patent: 6624393 (2003-09-01), Howell et al.
patent: 6633831 (2003-10-01), Nikoonahad et al.
patent: 6710354 (2004-03-01), Koch et al.
patent: 6714300 (2004-03-01), Rosencwaig et al.
patent: 6723663 (2004-04-01), Wieczorek et al.
patent: 6757051 (2004-06-01), Takahashi et al.
patent: 6784993 (2004-08-01), Opsal et al.
patent: 6800852 (2004-10-01), Larson et al.
patent: 6813026 (2004-11-01), McAninch
patent: 6870598 (2005-03-01), Nishi
patent: 6910842 (2005-06-01), Yeaple
patent: 7033846 (2006-04-01), Yu
patent: 7061614 (2006-06-01), Wang et al.
patent: 7067818 (2006-06-01), Harrison
patent: 7067819 (2006-06-01), Janik
patent: 7126131 (2006-10-01), Harrison et al.
patent: 7253901 (2007-08-01), Janik et al.
patent: 7349079 (2008-03-01), Zhao et al.
patent: 7359052 (2008-04-01), Fielden et al.
patent: 7369233 (2008-05-01), Nikoonahad et al.
patent: 7394551 (2008-07-01), Harrison et al.
patent: 7408641 (2008-08-01), Kwak et al.
patent: 2002/0018217 (2002-02-01), Weber-Grabau et al.
patent: 2003/0047692 (2003-03-01), Nagasaka et al.
patent: 2003/0073255 (2003-04-01), Narayanan
patent: 2003/0179985 (2003-09-01), Zhou
patent: 2004/0196549 (2004-10-01), Aono
patent: 2005/0252752 (2005-11-01), Fielden et al.
patent: 2006/0182329 (2006-08-01), Yamada et al.
patent: WO 99/45340 (1999-09-01), None
patent: WO 00/65331 (2000-11-01), None
patent: WO 02/25723 (2002-03-01), None
Boher et al. “Precise Characterization of Resists and Thin Gate Dielectrics in The VUV Range OFR 157 nm Lithography,” Mat. Res. Soc. vol. 636 (2001).
Boher et al., “A New Purged UV Spectroscopic Ellipsometer to Characterize Thin Film and Multilayers at 157 nm,” SPIE vol. 3998 (2000).
European Search Report for European Appln. No. 05751944.9 dated Apr. 11, 2008.
Gulliksen, E. et al. “A Soft X-ray/EUV Reflectometer Based on a Laser Produced Plasma Source.” Journal of X-ray Science and Technology 3, (1992), pp. 283-299.
Herman, P.R. et al. “F2-lasers: high resolution micromachining system for shaping photonic complenents” Conference on Lasers & Electro-optics. (CLEO 2001). Technical Digest Post Conference Edition. Baltimore, MD, May 6-11, 2001, Trends in Optics & Photonics (Tops), US, Washington, WA: OSA, US, vol. 56, May 6, 2001, pp. 574-575.
OBB Light Sources—Lamp Emission Spectra. Datasheet [online]. Photon Technology International, 2004; http://www.pti-nj.com/obb—spectra.html.
Samson et al., “Vacuum Ultraviolet Spectroscopy I” Academic Press 1998, p. 77.
Synowicki, R.A. et al. “Optical properties of bulk c-ZrO2, c-MgO and a-As2S3 determined by variable angle spectroscopic ellipsometry” Preparation & Characterization, Elsevier Sequoia, NL, vol. 455-456, May 1, 2004, pp. 248-255.
Tiwald et al. “Measurement of Rutile TiO2 Dielectric Tensor from 0.148 to 33 um Using generalized Ellipsometry.” SPIE vol. 4103 (2000).
VUV-VASE Variable Angle Spectroscopic Ellispometer from Vacuum Ultraviolet to Near Infrared Flyer, J.A. Woollam Co., Inc. (2003).
Wagner et al. “Materials Characterization in the Vacuum Ultraviolet with Variable Angle Spectroscopic Ellipsometry” Phys. Stat. Sol. (a) 188, No. 4, (2001).
Mount et al. “Compact far ultraviolet emission source with rich spectral emission 1150-3100 A,” Applied Optics, vol. 16, No. 3, Mar. 1977, pp. 591-595.
Mount et al. “Comprehensive analysis of gratings for ultraviolet space instrumentation,” Applied Optics, vol. 17, No. 19, Oct. 1978, pp. 3108-3116.
S. Wang et al., “ARCES: an echelle spectrograph for the Astrophysical Research Consortium (ARC) 3.5m telescope,” SPIE Proc. 4841, 1145-1156 (2003).
U.S. Appl. No. 60/974,030 (Bhaskar et al.) entitled Systems and Methods for Creating Persistent Data for a Wafer and for Using Persistent Data for Inspection-Related Functions filed on Sep. 20, 2007.
Fielden John
Janik Gary
Lee Shing
KLA-Tencor Technologies Corp.
Lauchman L. G
Mewherter Ann Marie
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