Systems and methods for forming tantalum oxide layers and...

Details Systems and methods for forming tantalum oxide layers and... Systems and methods for forming tantalum oxide layers and...

2008-05-06

2008-05-06

Pham, Hoai v (Department: 2814)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S681000, C438S778000, C438S643000, C438S508000, C438S508000

Reexamination Certificate

active

10924096

ABSTRACT:
A method of forming (and apparatus for forming) a tantalum oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and a tantalum precursor compound that includes alkoxide ligands, for example.

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