Systems and methods for forming metal oxides using metal...

Details Systems and methods for forming metal oxides using metal... Systems and methods for forming metal oxides using metal...

2006-07-17

2008-10-21

Whitehead, Jr., Carl (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S785000, C118S715000

Reexamination Certificate

active

07439195

ABSTRACT:
A method of forming (and an apparatus for forming) a metal oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and one or more precursor compounds that include aminosilane ligands.

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