Systems and methods for forming metal oxides using metal...

Details Systems and methods for forming metal oxides using metal... Systems and methods for forming metal oxides using metal...

2006-08-08

2006-08-08

Schillinger, Laura M. (Department: 2813)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S785000, C438S681000

Reexamination Certificate

active

07087481

ABSTRACT:
A method of forming (and an apparatus for forming) a metal oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process and one or more precursor compounds that include aminosilane ligands.

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