System, method and apparatus for in-situ substrate inspection

Details System, method and apparatus for in-situ substrate inspection System, method and apparatus for in-situ substrate inspection

2008-07-08

2008-07-08

Pham, Hoa Q (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237400

Reexamination Certificate

active

07397555

ABSTRACT:
A system for inspecting a substrate includes a camera and a light source. The camera is oriented toward a field of view. The field of view encompasses at least a first portion of a first surface of the substrate. The light source is oriented toward the field of view at a first angle β relative to the first surface of the substrate. A method for inspecting a substrate is also included.

REFERENCES:
patent: 5581348 (1996-12-01), Miura et al.
patent: 5864394 (1999-01-01), Jordan, III et al.
patent: 7106433 (2006-09-01), Hasan
patent: 7177019 (2007-02-01), Stanke et al.
patent: 2004/0012775 (2004-01-01), Kinney et al.
patent: 2004/0021856 (2004-02-01), Nishiyama et al.
patent: 2006/0250612 (2006-11-01), Meeks
PCT International Search Report—PCT/US05/42918, Feb. 14, 2007.

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