Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-09-15
1988-01-05
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
118720, 156643, 20419211, 20419212, 20419225, 204298, 427 34, 427 39, 437225, C23C 1400
Patent
active
047174617
ABSTRACT:
A method of processing a plurality of semiconductor wafers from a wafer cassette including a wafer transfer housing and one or more processing chambers. A wafer is removed from its cassette and transported through the transfer housing into one or more processing chambers for etching, deposition or other such operations. The processed wafer is replaced into its cassette after being transported back through the wafer transfer housing.
REFERENCES:
patent: 4405435 (1983-09-01), Tateishi et al.
patent: 4477311 (1984-10-01), Mimura et al.
patent: 4534314 (1985-08-01), Ackley
patent: 4560462 (1985-12-01), Radford
patent: 4587002 (1986-05-01), Bok
patent: 4622918 (1986-11-01), Bok
patent: 4650064 (1987-03-01), Slabaugh
patent: 4661228 (1987-04-01), Mintz
Brown Hobart A.
Lamont, Jr. Lawrence T.
McCormick Lonnie W.
Mosely Roderick C.
Peterson Carl T.
Demers Arthur P.
Machine Technology, Inc.
LandOfFree
System and method for processing workpieces does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System and method for processing workpieces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for processing workpieces will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-7508