System and method for etching a mask

Details System and method for etching a mask System and method for etching a mask

2005-05-17

2005-05-17

Smith, Matthew (Department: 2825)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

Reexamination Certificate

active

06893975

ABSTRACT:
A system and method for transferring a pattern from an overlying layer into an underlying layer, while laterally trimming a feature present within the pattern is described. The pattern transfer is performed using an etch process according to a process recipe, wherein at least one variable parameter within the process recipe is adjusted given a target trim amount. The adjustment of the variable parameter is achieved using a process model established for relating trim amount data with the variable parameter.

REFERENCES:
patent: 6235609 (2001-05-01), Sengupta et al.
patent: 6716570 (2004-04-01), Nagarajan et al.

Affiliated with

Also associated with

Rating

System and method for etching a mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for etching a mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for etching a mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3446939