System and method for electron-beam lithography

Details System and method for electron-beam lithography System and method for electron-beam lithography

2007-10-02

2007-10-02

Berman, Jack I. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

C250S492200

Reexamination Certificate

active

11109861

ABSTRACT:
To achieve high-resolution lithography, the temperature of a sample is controlled with heater wires during electron-beam lithography, the adverse effect of a magnetic field induced by the heater current is suppressed. Namely, heater wires are used to control the temperature of a sample so that the temperature will be maintained constant. In order to minimize the adverse effect of a magnetic field during the passage of currents through the heater wires, two heater wires are layered with the arrangement of the upper and lower sides, currents are fed to flow through the heater wires in mutually opposite directions, and the ratio of the current flowing through the upper heater wire to the one flowing through the lower heater wire is slightly changed from zero.

REFERENCES:
patent: 4789781 (1988-12-01), Kitagawa et al.
patent: 5898177 (1999-04-01), Hidaka et al.
patent: 6495838 (2002-12-01), Yaguchi et al.
patent: 2006/0033035 (2006-02-01), Itzkovitch et al.
patent: 10-241621 (1998-09-01), None
patent: 2000-182759 (2000-06-01), None
patent: 2002-353116 (2002-12-01), None

Affiliated with

Also associated with

Rating

System and method for electron-beam lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for electron-beam lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for electron-beam lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3887381